References
Chen K J, Haberlen O, Lidow A, et al. GaN-on-Si power technology: devices and applications. IEEE Trans Electron Dev, 2017, 64: 779–795
Zhou C H, Chen W, Piner E L, et al. Schottky-ohmic drain AlGaN/GaN normally off HEMT with reverse drain blocking capability. IEEE Electron Device Lett, 2010, 31: 668–670
Lei J C, Wei J, Tang G F, et al. Reverse-blocking normally-off GaN double-channel MOS-HEMT with low reverse leakage current and low ON-state resistance. IEEE Electron Dev Lett, 2018, 39: 1003–1006
Uemoto Y, Hikita M, Ueno H, et al. Gate injection transistor (GIT)-a normally-off AlGaN/GaN power transistor using conductivity modulation. IEEE Trans Electron Dev, 2007, 54: 3393–3399
Zhang T, Zhang J C, Zhou H, et al. A>3 kV/2.94 m Ω·cm2 and low leakage current with low turn-on voltage lateral GaN Schottky barrier diode on silicon substrate with anode engineering technique. IEEE Electron Dev Lett, 2019, 40: 1583–1586
Saito W, Nitta T, Kakiuchi Y, et al. Suppression of dynamic on-resistance increase and gate charge measurements in high-voltage GaN-HEMTs with optimized field-plate structure. IEEE Trans Electron Dev, 2007, 54: 1825–1830
Acknowledgements
This work was supported in part by the Key Research and Development Program of Shaanxi (Grant No. 2020ZDLGY03-05), Key-Area Resarch and Development Program of Guangdong Province (Grant No. 2020B010174001), and National Natural Science Foundation of China (Grant Nos. 61574112, 61974115).
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Wang, H., Mao, W., Zhao, S. et al. Unidirectional p-GaN gate HEMT with composite source-drain field plates. Sci. China Inf. Sci. 65, 129405 (2022). https://doi.org/10.1007/s11432-021-3267-3
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DOI: https://doi.org/10.1007/s11432-021-3267-3