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Link to original content: https://dblp.uni-trier.de/rec/journals/mr/LeeKKKSSK13.rdf
Seonhaeng Lee et al.: Effect of negative bias temperature instability induced by a low stress voltage on nanoscale high-k/metal gate pMOSFETs. (2013) journals/mr/LeeKKKSSK13 10.1016/J.MICROREL.2013.07.026 Effect of negative bias temperature instability induced by a low stress voltage on nanoscale high-k/metal gate pMOSFETs. 7 Seonhaeng Lee 1 Cheolgyu Kim 2 Hyeokjin Kim 3 Gang-Jun Kim 4 Ji-Hoon Seo 5 Donghee Son 6 Bongkoo Kang 7 1351-1354 Microelectron. Reliab. Microelectron. Reliab. 53 9-11 2013 provenance information for RDF data of dblp record 'journals/mr/LeeKKKSSK13' 2020-02-22T19:28:00+0100