Seonhaeng Lee et al.: Effect of negative bias temperature instability induced by a low stress voltage on nanoscale high-k/metal gate pMOSFETs. (2013)journals/mr/LeeKKKSSK1310.1016/J.MICROREL.2013.07.026Effect of negative bias temperature instability induced by a low stress voltage on nanoscale high-k/metal gate pMOSFETs.7Seonhaeng Lee1Cheolgyu Kim2Hyeokjin Kim3Gang-Jun Kim4Ji-Hoon Seo5Donghee Son6Bongkoo Kang71351-1354Microelectron. Reliab.Microelectron. Reliab.539-112013provenance information for RDF data of dblp record 'journals/mr/LeeKKKSSK13'2020-02-22T19:28:00+0100