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Link to original content: https://dblp.uni-trier.de/rec/journals/dt/LiXB10.rdf
Hong Li et al.: Carbon Nanomaterials: The Ideal Interconnect Technology for Next-Generation ICs. (2010) journals/dt/LiXB10 10.1109/MDT.2010.55 Carbon Nanomaterials: The Ideal Interconnect Technology for Next-Generation ICs. 3 Hong Li 1 Chuan Xu 2 Kaustav Banerjee 3 20-31 IEEE Des. Test Comput. IEEE Des. Test Comput. 27 4 2010 provenance information for RDF data of dblp record 'journals/dt/LiXB10' 2020-05-17T11:44:12+0200