Hong Li et al.: Carbon Nanomaterials: The Ideal Interconnect Technology for Next-Generation ICs. (2010)journals/dt/LiXB1010.1109/MDT.2010.55Carbon Nanomaterials: The Ideal Interconnect Technology for Next-Generation ICs.3Hong Li1Chuan Xu2Kaustav Banerjee320-31IEEE Des. Test Comput.IEEE Des. Test Comput.2742010provenance information for RDF data of dblp record 'journals/dt/LiXB10'2020-05-17T11:44:12+0200