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Link to original content: https://dblp.uni-trier.de/rec/conf/nems/XiangWWZC09.xml
Weiwei Xiang Li Wen Hai Wang 0018 Qiuping Zhang Jiaru Chu Electrical and optical testing system for microplasma in scanning plasma etching. 572-576 2009 NEMS https://doi.org/10.1109/NEMS.2009.5068645 https://doi.ieeecomputersociety.org/10.1109/NEMS.2009.5068645 conf/nems/2009 db/conf/nems/nems2009.html#XiangWWZC09