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Link to original content: https://dblp.org/rec/journals/eswa/WangYHCC11.ris
Provider: Schloss Dagstuhl - Leibniz Center for Informatics Database: dblp computer science bibliography Content:text/plain; charset="utf-8" TY - JOUR ID - DBLP:journals/eswa/WangYHCC11 AU - Wang, Chia-Nan AU - Yang, Gino K. AU - Hung, Kuo-Chen AU - Chang, Kuei-Hu AU - Chu, Peter TI - Evaluating the manufacturing capability of a lithographic area by using a novel vague GERT. JO - Expert Syst. Appl. VL - 38 IS - 1 SP - 923 EP - 932 PY - 2011// DO - 10.1016/J.ESWA.2010.07.074 UR - https://doi.org/10.1016/j.eswa.2010.07.074 ER -