Andrew J. Fleming et al.: A nonlinear programming approach to exposure optimization in scanning laser lithography. (2016)conf/amcc/FlemingWGRN1610.1109/ACC.2016.7526580A nonlinear programming approach to exposure optimization in scanning laser lithography.5Andrew J. Fleming1Adrian Wills2Omid T. Ghalehbeygi3Ben Routley4Brett Ninness55811-5816ACCACC20162016provenance information for RDF data of dblp record 'conf/amcc/FlemingWGRN16'2021-04-09T18:47:59+0200