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Link to original content: https://dblp.org/rec/conf/amcc/FlemingWGRN16.rdf
Andrew J. Fleming et al.: A nonlinear programming approach to exposure optimization in scanning laser lithography. (2016) conf/amcc/FlemingWGRN16 10.1109/ACC.2016.7526580 A nonlinear programming approach to exposure optimization in scanning laser lithography. 5 Andrew J. Fleming 1 Adrian Wills 2 Omid T. Ghalehbeygi 3 Ben Routley 4 Brett Ninness 5 5811-5816 ACC ACC 2016 2016 provenance information for RDF data of dblp record 'conf/amcc/FlemingWGRN16' 2021-04-09T18:47:59+0200