Mariappan MurugesanE. SoneA. SimomuraMakoto MotoyoshiM. SawaK. FukudaMitsumasa KoyanagiTakafumi FukushimaCu-Cu Direct Bonding Through Highly Oriented Cu Grains for 3D-LSI Applications.1-420213DIChttps://doi.org/10.1109/3DIC52383.2021.9687604conf/3dic/2021db/conf/3dic/3dic2021.html#MurugesanSSMSFK21