Rui Liang et al.: Impacts of Deposition Temperature and Annealing Condition on Ozone-Ethylene Radical Generation-TEOS-CVD SiO2 for Low-Temperature TSV Liner Formation. (2019)conf/3dic/LiangLMKMKFT1910.1109/3DIC48104.2019.9058843Impacts of Deposition Temperature and Annealing Condition on Ozone-Ethylene Radical Generation-TEOS-CVD SiO2 for Low-Temperature TSV Liner Formation.8Rui Liang1Sungho Lee2Yuki Miwa3Kousei Kumahara4Mariappan Murugesan5Hisashi Kino6Takafumi Fukushima7Tetsu Tanaka81-43DIC3DIC20192019provenance information for RDF data of dblp record 'conf/3dic/LiangLMKMKFT19'2024-08-04T19:42:15+0200