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Link to original content: https://dblp.org/rec/conf/3dic/LiangLMKMKFT19.rdf
Rui Liang et al.: Impacts of Deposition Temperature and Annealing Condition on Ozone-Ethylene Radical Generation-TEOS-CVD SiO2 for Low-Temperature TSV Liner Formation. (2019) conf/3dic/LiangLMKMKFT19 10.1109/3DIC48104.2019.9058843 Impacts of Deposition Temperature and Annealing Condition on Ozone-Ethylene Radical Generation-TEOS-CVD SiO2 for Low-Temperature TSV Liner Formation. 8 Rui Liang 1 Sungho Lee 2 Yuki Miwa 3 Kousei Kumahara 4 Mariappan Murugesan 5 Hisashi Kino 6 Takafumi Fukushima 7 Tetsu Tanaka 8 1-4 3DIC 3DIC 2019 2019 provenance information for RDF data of dblp record 'conf/3dic/LiangLMKMKFT19' 2024-08-04T19:42:15+0200