@article{DBLP:journals/tcst/FlemingGRW19,
author = {Andrew J. Fleming and
Omid T. Ghalehbeygi and
Ben S. Routley and
Adrian G. Wills},
title = {Scanning Laser Lithography With Constrained Quadratic Exposure Optimization},
journal = {{IEEE} Trans. Control. Syst. Technol.},
volume = {27},
number = {5},
pages = {2221--2228},
year = {2019},
url = {https://doi.org/10.1109/TCST.2018.2836910},
doi = {10.1109/TCST.2018.2836910},
timestamp = {Fri, 09 Apr 2021 01:00:00 +0200},
biburl = {https://dblp.org/rec/journals/tcst/FlemingGRW19.bib},
bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/amcc/GhalehbeygiORF18,
author = {Omid T. Ghalehbeygi and
John O'Connor and
Ben S. Routley and
Andrew J. Fleming},
title = {Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography},
booktitle = {2018 Annual American Control Conference, {ACC} 2018, Milwaukee, WI,
USA, June 27-29, 2018},
pages = {6684--6689},
publisher = {{IEEE}},
year = {2018},
url = {https://doi.org/10.23919/ACC.2018.8431550},
doi = {10.23919/ACC.2018.8431550},
timestamp = {Sun, 08 Aug 2021 01:40:57 +0200},
biburl = {https://dblp.org/rec/conf/amcc/GhalehbeygiORF18.bib},
bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/amcc/FlemingWGRN16,
author = {Andrew J. Fleming and
Adrian Wills and
Omid T. Ghalehbeygi and
Ben Routley and
Brett Ninness},
title = {A nonlinear programming approach to exposure optimization in scanning
laser lithography},
booktitle = {2016 American Control Conference, {ACC} 2016, Boston, MA, USA, July
6-8, 2016},
pages = {5811--5816},
publisher = {{IEEE}},
year = {2016},
url = {https://doi.org/10.1109/ACC.2016.7526580},
doi = {10.1109/ACC.2016.7526580},
timestamp = {Fri, 09 Apr 2021 01:00:00 +0200},
biburl = {https://dblp.org/rec/conf/amcc/FlemingWGRN16.bib},
bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/IEEEcca/GhalehbeygiBFH15,
author = {Omid T. Ghalehbeygi and
Garth Berriman and
Andrew J. Fleming and
John L. Holdsworth},
title = {Optimization and simulation of exposure pattern for scanning laser
lithography},
booktitle = {2015 {IEEE} Conference on Control Applications, {CCA} 2015, Sydney,
Australia, September 21-23, 2015},
pages = {1868--1873},
publisher = {{IEEE}},
year = {2015},
url = {https://doi.org/10.1109/CCA.2015.7320882},
doi = {10.1109/CCA.2015.7320882},
timestamp = {Wed, 16 Oct 2019 14:14:51 +0200},
biburl = {https://dblp.org/rec/conf/IEEEcca/GhalehbeygiBFH15.bib},
bibsource = {dblp computer science bibliography, https://dblp.org}
}
