Shun'ichiro Ohmi et al.: Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by Kr/O2-Plasma Sputtering. (2020)conf/drc/OhmiKKHM2010.1109/DRC50226.2020.9135170Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by Kr/O2-Plasma Sputtering.5Shun'ichiro Ohmi1Min Gee Kim2Masakazu Kataoka3Masaki Hayashi4Rengie Mark D. Mailig51-2DRCDRC20202020provenance information for RDF data of dblp record 'conf/drc/OhmiKKHM20'2021-06-11T08:27:10+0200