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Link to original content: https://dblp.dagstuhl.de/rec/conf/drc/OhmiKKHM20.rdf
Shun'ichiro Ohmi et al.: Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by Kr/O2-Plasma Sputtering. (2020) conf/drc/OhmiKKHM20 10.1109/DRC50226.2020.9135170 Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by Kr/O2-Plasma Sputtering. 5 Shun'ichiro Ohmi 1 Min Gee Kim 2 Masakazu Kataoka 3 Masaki Hayashi 4 Rengie Mark D. Mailig 5 1-2 DRC DRC 2020 2020 provenance information for RDF data of dblp record 'conf/drc/OhmiKKHM20' 2021-06-11T08:27:10+0200